ARDIS 300
Microwave plasma chemical vapor deposition system for growing mono- and polycrystalline diamonds
Grown by science,
proven by time
Developing and manufacturing systems for diamond synthesis via chemical vapor deposition since 2005
Since the release of our first systems, we have been accumulating and systematizing unique knowledge about the CVD synthesis process. This allows us not only to improve our technical solutions but also to anticipate the challenges our clients face.
Years of equipment operation in industrial and research environments allow us to guarantee technological maturity, process stability, and compliance with current requirements for the synthesis of functional carbon materials.
Applications
Designed for chemical vapor deposition of poly-, mono-, and nanocrystalline diamond films, as well as carbon nanotubes for various applications
Plasma-chemical diamond synthesis
Growing diamonds by chemical vapor deposition produces diamond samples of previously unattainable sizes, exceptional purity, with a unique set of electronic, optical, thermal, and mechanical properties.
Up to 6 kW
Microwave source power,
frequency 2.45 GHz
Процесс осаждения алмаза
из газовой фазы
В вакуумную камеру подается смесь метана (CH₄) и водорода (H₂) в соотношении несколько процентов углеводорода к водороду
Real-time monitoring
Fully automated monitoring and remote diagnostics of the growth process with real-time video control.
600–1400 °C
Контроль температуры подложки в диапазоне 600–1400 °C. Высокоточное измерение температуры
Стабильная плазма
Для широкого диапазона давлений, мощности и геометрии подложкодержателя
20–300 торр
Большой диапазон рабочего давления, существенно повышающий скорость роста моноалмаза
Technical specifications
Key technical parameters of the ARDIS 300 system
Documents and publications
Room requirements
Room requirements for installation and operation of the ARDIS 300 system
