ARDIS 300
Microwave plasma chemical vapor deposition system for growing mono- and polycrystalline diamonds
Grown by science,
proven by time
Developing and manufacturing systems for diamond synthesis via chemical vapor deposition since 2005
Since the release of our first systems, we have been accumulating and systematizing unique knowledge about the CVD synthesis process. This allows us not only to improve technical solutions, but also to anticipate the challenges our clients face.
Years of equipment operation in industrial and research environments guarantee its technological maturity, process stability, and compliance with current requirements for synthesizing functional carbon materials.
Applications
Designed for chemical vapor deposition of poly-, mono-, and nanocrystalline diamond films, as well as carbon nanotubes for various applications
Plasma chemical diamond synthesis
Growing diamonds by chemical vapor deposition produces diamond samples of previously unattainable sizes and exceptional purity, possessing a unique combination of electronic, optical, thermal, and mechanical properties.
Up to 6 kW
Microwave source power,
frequency 2.45 GHz
Diamond chemical vapor deposition process
A mixture of methane (CH₄) and hydrogen (H₂) is fed into the vacuum chamber at a ratio of a few percent hydrocarbon to hydrogen
Real-time monitoring
Fully automated monitoring and remote diagnostics of the growth process with real-time video control.
600–1400 °C
Substrate temperature control in the range of 600–1400 °C. High-precision temperature measurement
Stable plasma
For a wide range of pressures, powers, and substrate holder geometries
20–300 Torr
Wide operating pressure range significantly increasing single-crystal diamond growth rate
Technical specifications
Key technical parameters of the ARDIS 300 system
Documents & publications
Room conditions
Room requirements for installation and operation of the ARDIS 300 equipment
