Excimer lasers
OLS100K
Narrow-linewidth excimer laser for projection photolithography
248.4nm
Wavelength
0–1000Hz
Max. repetition rate
< 3pm
Spectral linewidth
< 6pm
Spectral linewidth
< 3%
Energy stability
11–13mm
Beam size, height
3.5–4.5mm
Beam size, width
> 95%
Polarisation
< 10min
Warmup time
Maskless lithography
Features
Specifications
Wavelength | 248.4nm |
Max. repetition rate | 0 – 1000Hz |
Max. pulse energy | 5mJ |
Energy stability | < 3% |
Divergence(FWHM, V х H) | 3.5 x 1.5mrad |
Pulse duration(FWHM) | 7 – 12ns |
Spectral linewidthFWHM | < 3pm |
Spectral linewidthat 10% (max) | < 6pm |
Energy stabilitysigma for 1000 pulses | < 3% |
Beam size, heightFWHM, at 0.5 m from output aperture, HxW | 12 ± 1mm |
Beam size, widthFWHM, at 0.5 m from output aperture, HxW | 4 ± 0.5mm |
Polarisation | > 95% |
Warmup time | < 10min |
Dimension(L х W х H) | 1025 × 450 × 610mm |
Weight | 132kg |
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